为减小电枢喉部电流密度的同时强化电枢机械性能,在传统固体电枢结构基础上,依据叠片电枢设计原理,提出了一种更有利于加工装配的双层电枢结构设计方案。双层电枢由两部分组成,喉部区域单独分割出来称为Part-2,剩余部分为Part-1,两部分通过机械装配或焊接的方式组成双层电枢。通过数值计算的方法分别对双层C型和H型电枢的电磁力和电流密度分布进行计算,并与传统电枢进行比较。计算结果表明:随着Part-2电阻的增大,最大电流密度区域逐渐由Part-2转移到Part-1,能有效减小电枢喉部电流密度,但电阻过大会显著增加电枢整体的电流密度。Part-2宜采用熔点高,机械性能好,电阻与铝相差较小(R/R_Al<1.4)的材料,为电枢结构优化和性能强化提供有益参考。

In order to reduce the current density at the armature throat and enhance the mechanical performance of armature, based on the traditional solid armature structure and the design principle of laminated armature, a design scheme of laminated armature (double-layer armature) structure is proposed, which is more conducive to machining and assembling. The double-layer armature consists of two parts, The throat region is called Part-1, and the rest is Part-2. The two parts form a double-layer armature by mechanical assembly or welding. The electromagnetic force and current density distributions of double-layer C-type and H-type armature are calculated by numerical method, and compared with the results of traditional armature.With the increase of Part-2 resistance, the maximum current density region is transferred from Part-2 to Part-1, which can effectively reduce the current density of armature throat, but excessive resistance will significantly increase the maximum current density of armature. Part-2 should adopt materials with high melting point, good mechanical properties and small difference between resistance and aluminum(R/R_Al<1.4), providing useful reference for armature structure optimization and Performance enhancement.